World Leaders in PVD Magnetron Sputtering
Clusterbeam Systems
Since 2006, the ClusterGen Max-200 Cluster-beam system has been developed by TeerCoatings to synthesis nano-clusters in gas-phase via magnetron sputtering technology.
When combined with mass filtering technology, the cluster size distribution can be narrowed down to a small range. Over the years, the system has gone through many generations of improvement. Based on intensive research work on aerodynamic modelling and magnetic field modelling, this state-of-art instrument can
produce single-element or alloy clusters with high deposition rates. Whether it’s plate, disk or powder substrate, the system can be tailored to suit your requirement.
Standard Features
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Broad cluster size range: from single atom to >10 nm in diameter.
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Narrow size distribution: typically +/- 10% of user selected diameter or better.
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Wide choice of cluster materials: most metallic elements and selected semiconductor materials.
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Single Sputtering Source: in addition to single element clusters alloy clusters can also be produced if an alloy target is used.
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Cooling: the condensation chamber can be cooled by water or liquid Nitrogen
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Versatile substrate materials and forms: clusters can be deposited onto plates, disks or powders, made of metal, glass, ceramic, polymer, or plastic, etc
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High deposition rate: > 1 nA beam current for size-selected well-understood clusters, typically 100 ~ 200 pA
for normal clusters. -
Well controlled deposition energy: from soft landing to high energy impact
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Computer controlled: all functions are controlled via the software interface.
Optional Extras
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Powder Deposition Chamber: allows Cluster deposition
onto powders. -
Multiple Magnetrons: 2 or 3 magnetrons can be integrated into the design allowing multiple targets to be sputtered to form alloy clusters.
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Nanocomposite material deposition: one magnetron can
be added into the deposition Chamber for co-deposition of clusters and thin film at the same time to form nanocomposite materials. -
UHV: the system can be built to be UHV compatible.
Examples of Application Areas
& Research and Development
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Nano-clusters for biological sensing and imaging
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Nano-clusters for photonics
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Nano-clusters for magnetic materials
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Nano-composite materials
Modular design
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Cluster aggregation source module
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Ion-optics module
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Mass filtering module
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Deposition module for size-selected clusters
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Deposition module for non-size-selected clusters
(eg. Powder deposition unit)
